Plasma-Assisted Deposition at Atmospheric Pressure
نویسندگان
چکیده
منابع مشابه
Plasma-Assisted Deposition at Atmospheric Pressure
In plasma-assisted deposition methods the activation energy necessary for the initiation of chemical reactions is transferred via charged particles. Due to this fact in many cases the process temperature can be kept small, if gas discharges at pressures below 1 hPa are used. On the other hand low pressure requires a great deal of vacuum equipment. Processes at atmospheric pressure are more favo...
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ژورنال
عنوان ژورنال: Le Journal de Physique IV
سال: 1995
ISSN: 1155-4339
DOI: 10.1051/jphyscol:1995569